15. Molecular Beam Epitaxy in Thin Film Deposition - Meaning, Working, Condition, Uses using Diagram

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Gyan Sampada

Gyan Sampada

Күн бұрын

Пікірлер: 6
@murugapandiyanp3660
@murugapandiyanp3660 2 жыл бұрын
Nice explaination
@gyansampada4587
@gyansampada4587 2 жыл бұрын
Thank you 🙂
@jarmyvicious
@jarmyvicious 2 жыл бұрын
Salut and Thank You! I did not know such a process had ever existed until the last hour.... but thanks to you, there is a small possibility that I could eventually begin to understand why these components act or refuse to act, or as they do on various combinations distributed in layers which subsequently shall remain stable and nonreactive by this method.... though could this be done differently, perhaps an experiment might be possible quite high above the earth's surface; by utilizing an appropriate substrate, such as a vapour, chaff, or maybe even an organism.... and as one wishes; apply certain metallic salts and gasses, magnetic field and frequency (doppler, microwave) by beam, in alteration or in a way to achieve interaction, the result of the experiment; a loaded aerosol if deployed from wing nozzles.... by modifying the amped up conditions, I might be better able to predict the movement and strength concerning weather systems? Okay, maybe I got carried away, maybe just a little bit.... but,.is this a viable method?
@gyansampada4587
@gyansampada4587 2 жыл бұрын
Thank you for your valuable response.. As such if we need to do something then we need to tune many parameters accordingly so that we get the things on a right path..It is a challenging task however can be thought of by considering different upgradations!
@annebogs7249
@annebogs7249 8 ай бұрын
How are the impurities directed to the cryopanels? What are the parameters for this?
@gyansampada4587
@gyansampada4587 8 ай бұрын
Cryopanels are essential to the UHV chamber. Within the vacuum chamber there are two cryopanels- the growth cryopanel and the source cryopanel. The growth cryopanel surrounds the wafer holder & helps cryotrap impurities near the wafer. The source cryopanel has openings for each material source, allowing molecules to pass through & reach the substrate. These cryopanels provide thermal isolation for the material sources, allowing temperature to be controlled independently & ensuring consistent evaporation of molecules. It is important to that for MBE process requires the cryopanels to be continuously wetted with LN- closed loop circulation with a constant flow. I hope you will find this helpful👍
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