Chamber Cleaning with Advanced Energy Remote Plasma Sources

In this video, learn how Advanced Energy's MAXstream remote plasma source (RPS) is used in CVD chamber cleaning. Extending AE’s leadership in process power, MAXstream delivers reliable performance across a broad range of flow rates, increasing productivity in semiconductor process equipment.

[@kevindelgado7083]

Does tge chamber need to be completely isolated?

[@seans2339]

No the chamber should not being isolated, chamber must be pumping down and serve specific pressure to maintain plasma.