Lecture 37 (CHE 323) Etch, part 4

[@SaliAcid]

Thanks for your great lectures! I'm a senior in INHA University in S.Korea majoring in Electrical Engineering. I couldn't sign up for semi-conductor classes in my school life. but I've always wanted to work in semi-conductor industry. Your lectures are so easy to understand. So, it helps me to getting basic semicon knowledge.

[@JoaoCunha-wd1nj]

Thank you Chris, I think this is one of the best series and best explanations I faced, its amazing how simple you can explain this advanced concepts. Thank you very much!

[@susmitaganguly1760]

The lectures are so good. By the meantime I got some questions: 1. Why you don't want H in the RIE process? 2. What causes etched features at one edge of the wafer to have higher etch rates? 3. What causes the overall wafer-scale etch rate variation pattern observed in wafers?

[@ChrisMack]

PDF copies of all the slides in this course are available at: www.lithoguru.com/scientist/CHE323/course.html

[@Jarrod_C]

What about cryogenic etching?

[@reemalshanbari]

Hello Mack - CF4 can etch Si. So, I think it is not possible to use it when you etch Sio2 on top of si. They have very low selectivity, correct me if I'm wrong. Thank you