CMOS Inverter fabrication Process

Silicon single crystal wafer is the starting base material for manufacture of an ASIC. Semiconductor process steps involve repaeted cycles of photolithography, etching, doping, deposition, and planarization are, used to, create complex C mos gate structure. Base layer create devices, and ,Insulated metal layers create interconnects and, the combination of them builds an ASIC Structure.
This video presents a simplified fabrication process of a CMOS Inverter gate - a basic building block of digital electronics.