23:07 The diffusion of the pmos can still be shared although it's contacted so total should be 4C?
@ofek28525 ай бұрын
He explicitly noted that it is because of the contact metal, one should ensure enough space to meet DRC. Therefore, it is considered as separated capacitance
@fakeraees57903 ай бұрын
This topic is very confusing. At 8:00 Where Cgsp, Cgsn gone??
@socialogic97772 жыл бұрын
Cgbn - capacitance between gate and body contributes to net drain capacitance or net gate capacitance? Similarly Cgbp in PMOS case?
@AbhishekSingh-up4rv2 жыл бұрын
net gate capacitance is sum of (Cgb + Cdgd+ Cgs)nmos = C
@bharadwaj7679 ай бұрын
10::45_16-04-24_@IIIT-H In Nand, N1 drain and N2 source shares same diffusion (so, single cap C) But P1 & P2 drains could also be considered as common diffusion right!? --> we have metal contact thus we need a finite spacing b/w both P1, P2 drains diffusions (I don't understand this)
@ofek28525 ай бұрын
This spacing results a separated capacitance
@joyatidas1016 Жыл бұрын
is the layout of the NAND gate correct? Won't the position of A and B gates reversed.
@chetanggs Жыл бұрын
Position of A and B connection doesnot matter , As at the end Y=(AB)'
@pseudohawk16562 жыл бұрын
Can we share diffusion cap of transistors who have different widths?
@pseudohawk16562 жыл бұрын
Like 2 in series with 4 sized NMOS
@ofek28525 ай бұрын
No you can't. It is not considered as shared because different width results in different capacitance by definition. Moreover, I don't think we use different sizes of transistors at the same design\process. Instead, one can connect a bunch of transistors in series\parallel
@vivekkar79219 ай бұрын
what is effect of gate capacitance on leakage current
@ofek28525 ай бұрын
If you're asking about leakage current, it means you are analyzing your circuit in dc. hence you shouldn't care about your parasitic capacitance. btw, leakage is at OFF state where delay consequences are not relevant. Therefore, parasitic caps are not relevant.