Lecture 19 (CHE 323) Rapid Thermal Processing (RTP)

[@edehobinna]

Thank you very much Prof. Chris. This video series helped me a lot in understanding Wafer fabrication. May God continue to bless you

[@Triforce1985]

I'm happy I found these lectures. It is helping me at my current job and hopefully will lead to me getting a position in processing wafers with ion implantation and RTP. Something I have a lot of interest in.

[@ChrisMack]

PDF copies of all the slides in this course are available at: www.lithoguru.com/scientist/CHE323/course.html

[@rehoboth_farm]

I worked on Amat 5200 RTPs in Intel's P858 process. That was a long time ago but those were really incredible machines.

[@possible-realities]

Since there is a thermal budget for all the steps carried out after adding a given dopant, why anneal directly after e g ion implantation? Couldn't you wait and put everything that needs to be annealed in place, and then anneal everything at once? Maybe as the last high temperature step, before you introduce something that can't take high temperatures? Or is it important to reform the crystal structure directly after e g ion implantation, to make the following steps to work correctly?

[@bowu2094]

Thank you for sharing this.

[@tgmorrissey]

What is a typical lifetime of one of those outer ring ceramic pieces?

[@leofang2814]

Dear Dr. Mack, What kind of temperature measurement technology RTP uses pyrometer mentioned in the presentation? Pyrometer measurement wavelength can be generally used in wafer 0.9 um, however, the heating lamp is started, will be Pyrometer interference, there is a way to ask Dr.Mack measured temperature it? Thanks a lot.

[@stmbaah]

Thank you!

[@Hndm27]

If recrystallization has higher activation energy than diffusion then how can it be fast at high temp than diffusion.

[@ChrisMack]

High activation energy means that the rate constant changes more rapidly as temperature is increased. Thus, as temperature goes up, diffusion rate rises more slowly than the recrystallization rate. At a high enough temperature, recrystallization dominates.

[@ilijapjescic5102]

How is controlled cooling accomplished in an RTP system?

[@chrismack783]

I don't know about any specific system, but the conventional way of cooling is to place the wafer on (or in close proximity to) a chill plate - like a hot plate, but with coolant running through the plate to keep it cool.

[@mamathagowda236]

Dear Dr. Mack, I am new to understanding deposition techniques. Am not sure if RTP/RTE is a Physical Vapour Deposition or Chemical Vapour Deposition! Can you kindly help me out?

[@chrismack783]

RTP is frequently used with CVD (Chemical Vapor Deposition). I have not seen RTP combined with PVC (Physical Vapor Deposition).

[@mamathagowda236]

Chris Mack thank you Dr.Mack!

[@daps1812]

Hello Chris, very interesting lectures. I have a question, regarding homework 5, in the solution it says that Rp standard deviation is around 0.014 um (from the figure), but you put 0.014e-4, is this an error or did I miss something? best regards

[@ChrisMack]

Units. In the equation the units are cm.

[@reemalqarni6157]

Hello .I have question please is there different between RTP and RTA?because I shout RTA kind of RTP

[@ChrisMack]

Yes, RTA is a type of RTP.