Nanoindentation Technique Introduction

[@mani2263]

Very well explained presentation!

[@LondonA2Z]

Very beneficial. Thank you.

[@Huanhaichenfu]

Very clear explanation

[@mendozaolguinjuliana8431]

Thanks for the video!

[@aleshinteregger8554]

thank you

[@cosanostra8341]

Hello, thank you very much for the explanation!! I did nanoidentation on a photoresist with 3 different layer thicknesses (4.5um, 5.2um and 6.5um) with a penetration depth of 500nn. i'v come to the conclusion that when the thickness of the photo resist is bigger, then the foto resist is harder. Do you have an idea why?? Thank you very much!!!

[@aifncstateuniversity4762]

In general, film thickness and film hardness is known to typically be negatively correlated for thin films (meaning, increasing thickness =increasing hardness). However, these appear to be thicker films with a very shallow indentation depth by comparison - so the photoresist could essentially be considered a bulk material at this scale and thin film behavior may not be applicable in this case. It's possible this explains your result, but would encourage you to consider there may be other factors contributing to the higher measured hardness for the top most surface of this otherwise thicker film.