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There will be a beginners free on-line workshop on 9th March organised by Lehigh University and presented by Neal Fairley. Details can be found on: ifmd.lehigh.edu/xps-workshop
Fused Silica and ppHex on SiO2 are used to examine quantification by XPS and how different corrections are applied to photoemission peak areas to obtain meaningful sample chemistry. Quantification tables and annotation presenting the same information as a text string using chemical symbols are illustrated. This influence of a surface overlayer on quantification of a substrate is examined using ppHex on SiO2.