As a chip designer, I never stop having my mind blown when we get silicon back from the foundry. You slave for months over these chips, and you are used to seeing them the size of a massive screen, having to zoom in like crazy doing the connections of small signals, when zoomed out not even being able to see whole functional blocks like complex operational amplifiers or so on, let alone the huge individual transistors (huge with respect to the tiny transistors we use in digital circuits). And then you get silicon back, and that huge chip is suddenly so small in that wafer gel pack that if you were to sneeze, you would lose them all, and never find them again.
@DrBlokmeister9 ай бұрын
As a lithographer, I'm always amazed by how chip designers optimize and design their chips so they can actually be manufactured on our machines, given all the conditions that we give you guys. Mad respect!
@ddopson9 ай бұрын
@@DrBlokmeister I'd be very eager to learn if both of you listed some of the more interesting constraints. Perhaps the chip designed and the lithographer might even have different takes about which constraints are the trickiest. I have some vague ideas of the constraints, but am neither a chip designer nor a lithographer, so my understanding is a bit abstract and still rather hand-waived. For example, I recall some of the constraints deriving from the diffraction pattern on the mask such that if certain desired patterns are placed to near to each other, there's no way to construct a diffraction mask that generates that pattern due to various interference effects. Corners and ends of lines are particularly tricky. I recall that many chips now use multiple patterns per layer in oder to work around these imaging constraints by putting part of the pattern one mask and part on a second mask.
@DrBlokmeister9 ай бұрын
@@ddopson The constraints are I think more subtle. You are definitely correct. But in the end it's all about achieving a level of contrast and the correct feature width (CD) that is acceptable for the rest of the fabrication process. Depending on the topology of the structures, you need a certain depth of focus and might need to tune the machine to reach the desired values. What you're saying is also not wrong. I think in the end our constraints are combined with all the other constraints in the manufacturing process, determined by the resist, material properties, etching, etcetera. Those final constraints are then communicated to the chip designers. At least, that's how I thought the process goes. If a chip designer tells you differently, believe that person!
@JorenVaes9 ай бұрын
@@ddopsonFrom what I understand, a lot of these details are ironed out by the foundry through their DRC (Design rule check) ruledeck. These have rules at their most basic do things like 'don't put lines closer than x nm to each other' or 'no line shorter than y nm', but quickly starts doing very complicated things like 'minimum line spacing is x nm unless you have more than y lines next to each other in parallel of the same width then you can decrease the line spacing to z nm except in the case where you need to contact the lines with a via in which case it changes again' blah blah blah, to the point that these rule decks are literally hundreds of pages (I think the one for the technology I worked in most recently is over 400 pages). This is where a lot of the crazy stuff really is - there are rules that will allow you to only place lines on the finest structures in a certain pattern, with certain repetitiveness and on a grid, to make use of diffraction patters (or at least that is how I understand it - Sander might be able to correct me here). Another example is that you might start using multiple patterning, where one metal layer is split up into multiple masks and soon to make more complex shapes possible. The chipdesigners who really come close into contact with this are the people who design the standard cells---the basic logic gates---which really need to make as optimal use of all these tricks and features as possible, since they drive area of chips. In what I do (millimeter-wave chip design), the things that determine cost and area are not the transistors, but big passives like inductors and capacitors, and so we mostly look at performance of the transistor and not the area.
@DrBlokmeister9 ай бұрын
@@JorenVaes Very cool insights and context that you provide! All these rules you mention in the beginning make complete sense from an imaging point of view. Of course if all you want to do is place lines and spaces together, you can squeeze them in to the limits of your optics system. But as soon as you need something else, then that's gonna come at a cost. The more repetitive your structure, the easier it is to optimize for. If you want multiple structures at the same time, you have to optimize for all at the same time, and this means that all feature will perform worse than they could if you'd print them separately. Also if you put things on a fixed grid, then your diffraction pattern will be discrete, as the Fourier transform of a grid is also a grid. This makes it easier to optimize the illumination settings (incidence angle of light). As soon as you want to place one feature off-grid, it will likely underperform and maybe not print well.
@barthchris111 күн бұрын
Mind boggling is an understatement! I always knew the "shrink" created by EUV was extreme but man, your 1 micron to 12nm example really helped me
@Chriss1209 ай бұрын
While studying we went over some basics of euv lithography, but NEVER in such a high level of detail like you just provided. Amazing to see behind the scenes how much this technology needs to account for.
@YSoreil9 ай бұрын
Alright these were the last trade secrets I needed to finish my DIY home EUV setup. I just have to find a nice value for k1 and I'm golden.
@DrBlokmeister9 ай бұрын
For EUV in your garage, probably you can be extremely happy with a k1 of 10000. :D
@Hippida9 ай бұрын
Awesome! What's your light source ?
@DrBlokmeister9 ай бұрын
@@Hippida a kid rubbing two sticks together really fast?
@raphofthehills44054 ай бұрын
And of course it's got to be 3D printable so that all of us can make a copy and start a DIY wafer revolution ! 😂
@DrBlokmeister9 ай бұрын
Something interesting on our lens that I realized after the recording is the huge size of our field. If we take the half pitch resolution as a single pixel (10nm), our field size is roughly 2,6 million by around 0.1 million pixels, so if we make it into a camera, it would be a roughly 260 terapixel camera, give or take a factor of two.
@diegogmx20009 ай бұрын
so do you use any spherical optics at all? and in terms of tolerance, what are we talking about? ion polishing everywhere?
@DrBlokmeister9 ай бұрын
@@diegogmx2000 I don't know, and if I did, I'm not allowed to say. Zeiss makes the lenses, they are the lens designers and fabricators, so lens design is technically not an ASML thing. We only use the lens. Although in reality the difference more subtle.
@diegogmx20009 ай бұрын
@@DrBlokmeister damn, im still surprised how compartimentalized these things are, good ways to stifle innovation to keep monopolies
@DrBlokmeister9 ай бұрын
@@diegogmx2000 I think it's also a result of the complexity of these machines. I don't know a lot about the complexity of the wafer/reticle handling robots, I have a limited time and brain capacity. The machine is too complex to understand completely. I'm not an expert here, but I think this is also why ASML outsources for example this lens design and manufacture to the companies that are the experts in this field. We know roughly what kind of a lens we need, and let the experts decide how to make that lens. That way we get the best lens we can and can focus on our expertise.
@HuygensOptics9 ай бұрын
Unfortunately, the field in the animations is quite a bit more limited.😁
@BRUXXUS9 ай бұрын
This video was a TREAT! ASML has always seemed like some ultra-secret black box of an organization. Very cool to see inside, meet people there, and get a deeper understanding of just how insane the tech they develop is.
@JanM3515313519 ай бұрын
Worked for a year for a metrology system manufacturer, mostly phase shifting interferometry. Not only the production of these really small features is a challenge, but being able to visualize them and measuring their height was also incredibly difficult (at the required throughput)! The thin films mess up the interferometry signal, which threw off the existing algorithms to estimate the height. At a certain point the lateral dimensions of the features also started to become a challenge, as they diffracted the light used to visualize them. Everything's so cutting edge in this sector, it's awesome!
@DrBlokmeister9 ай бұрын
It is insane! When you work on the nanometer or picometer scale, suddenly everything matters! I never hear about the challenges that other companies have, so it's interesting to hear these things!
@irobot-ng6li8 ай бұрын
I work in metrology team at ASML. Indeed, being able to measue incredibly small features at high enough throughput is incredibly challenging.
@ASM_01-vz4xp15 күн бұрын
@@irobot-ng6liyour lack of a command of basic language and grammar says otherwise.
@tomholroyd75199 ай бұрын
Computational Photolithography. Something we couldn't even do without the GPUs from the previous generation
@salmiakki56389 ай бұрын
Is that a computation that parallelizes well?😂
@mduckernz9 ай бұрын
@@salmiakki5638The light simulation step part is, iirc. But the steps before it that apply design rules so that it works well, are totally dependent on CPUs only as they’re too complicated for GPUs (way too much branching logic)
@phoneaccount69079 ай бұрын
Itschain- cell-hainelopment process. Chip calculates mask for even more powerfull chips ... Skynet is coming ... AI will prevail
@Hiksan59 ай бұрын
Another great video on an intersting subject. Like how you discuss topics at a high level of complexity in an stright forward and simple manner. The animations helped understanding a lot. Already looking forward to learn more super technical stuff!
@JakobWierzbowski9 ай бұрын
What a beautiful video. Thank you so much. As a semiconductor wafer technology developer and optics enthusiast, I must say that you ticked all the tick marks. Thank you very much Mr. Vleggaar
@hanstubben9 ай бұрын
Speak about finding borders of what is possible! The level of these guys and girls at ASML are unimaginable for us mere mortals. Moving around parts with several g-force and keeping it in distance within some nanometres is incredible, even for me as an mechanical engineer! Hats of for them!
@DrBlokmeister9 ай бұрын
Thanks! But even for us guys and girls, the stuff that we do is incredible. I focus only one tiny aspect, but when I speak to colleagues about other aspects, every single one comes with jaw-dropping things.
@WhatYouHaventSeen9 ай бұрын
@@DrBlokmeister I think you meant “jaw dropping,” not “draw dropping.” Otherwise it sort-of sounds like you are talking about peoples’ underwear falling down. While comical to imagine happening at ASML, I don’t think that was your intention.
@DrBlokmeister9 ай бұрын
@@WhatYouHaventSeen Ooops! 😅
@aether52139 ай бұрын
I for one would welcome all the details from the ASML visit, speaking as a physicist who studied photolithography and quantum optics. Thanks and godspeed!
@FXPearStudio9 ай бұрын
I'd watch hours and hours of your videos. No matter how deep and technical because you are really good with didactic. Please, more!
@Bunker2787 ай бұрын
It's nice to see the optical process described in terms of waves instead of rays. That made the strange looking mask and light source a lot easier to understand.
@Adrian-foto9 ай бұрын
14:17 As a telco engineer working with signal analysis I had an heureka moment. Basically thinking in fourier domain and radio signals, it is enough to recreate transmission with carrier and a single side-band and here we had something similar with light source positioned at angle to transmit 0th and half of 1st interference pattern through the imaging system. Thank You for the great content =) and merry Christmas
@DrBlokmeister9 ай бұрын
That's so true! All these fields are similar. The lens is simply a band pass filter with size of NA/lambda (in frequency space). By changing the incidence angle of the light onto the mask, you can change the position of the filter from minus half the lens size to plus half the lens size. As the diffraction pattern is simply a fourier transform of the electric field at the mask, it is easy to calculate the final image! You just have to iFFT(FFT(mask)*lens) and BAM! You're an imaging engineer!
@atonal4409 ай бұрын
@@DrBlokmeister🤯 it really is fourier sequences all the way down. Wheels within wheels...
@nicholaselliott24849 ай бұрын
Also didn’t think my basic understanding of “beamforming ” would apply, but shouldn’t be surprised that an array of light sources would not behave in a similar manner haha
@chalkchalkson56396 ай бұрын
@@DrBlokmeister Interesting! So I guess I can think of the lenses role in imaging as a convolution, since multiplication in k space is a convolution in r space. I've never thought about optical imaging in this way, only XRay and MRI imaging (medical physicist by training), but I guess it makes sense that it's similar. If the lense is a rectangular band pass filter in k space, where would I find the corresponding sinc in real space?
@DrBlokmeister6 ай бұрын
@@chalkchalkson5639 I think you're right here. The lens has a point spread function and the final image is a convolution of the point spread function and the mask. I think it's a bit more complex in the case of off-axis illumination. This sinc function is the point spread function I mentioned. It's the response of the lens when you try to image an infinitely small dot. Since for an infinitely small dot, the diffraction pattern is infinitely wide, the entire lens is filled with light, the intensity being 1 over the entire lens. Therefore the image will be a fourier transform of this square.
@joehopfield9 ай бұрын
Thank you! The overlay of modern chip features on an i486 via blows my mind - 1000 times smaller linearly, 1M smaller by area? I bet many of us would be happy to see a couple of hours of your un-edited chat with Sander, even if we won't understand most of it.
@vincei42529 ай бұрын
Funny, I just applied for a job at ASML. They're not far from me in CT, USA. Thanks for the overview! Just what I needed!
@HuygensOptics9 ай бұрын
Good luck, hope you get invited for an interview!
@vincei42529 ай бұрын
@@HuygensOptics Thank you. Fingers crossed!
@DrBlokmeister9 ай бұрын
Good luck! If you get hired and are interested, reach out to SBLS. We can geek out over lens designs and imaging!
@vincei42529 ай бұрын
@@DrBlokmeister Awesome. Would be fun. I'm currently building a drift scanning camera for astronomy (my other hobby) so your thoughts would be much appreciated!
@vmiguel19889 ай бұрын
@vincei4252, ASML is on hire freeze right now, don’t get discouraged if you don’t get the position at this moment.
@benheideveld46178 ай бұрын
One of the very few truly high tech video’s on KZbin that doesn’t dumb down reality. So in fact all iPhones and Samsungs are made in The Netherlands… Fascinating!
@UlissesMartins5 ай бұрын
Is truly absolutely fascinating. But have in mind that ASML has workers, engineers and brilliant minds for all over the planet and also the main components and technology comes from several other countries and without them this technology and machines will be impossible. What this machines do and also the others thousand machines do to fabricated the logic and memory chips is absolutely the state of the art and are some kind of magic for an ordinary human being.
@russelldicken99309 ай бұрын
Wow! I appreciate the simplification. So many things I had not considered go into wafer manufacture. Truly mind blowing.
@ivolol7 ай бұрын
Would love to get a full interview dump on a Huygens Topics 2 channel. Getting to talk to smart guys basically at the forefront of an engineering field is always super interesting to me too! Even knowing 1/1000th what you do
9 ай бұрын
Amazing and enlightening video, both literally and figuratively! One of few on KZbin that deserves you take a moment and watch it properly focused and concentrated. The moment of realization is a priceless experience.
@SuperMutantSomething9 ай бұрын
I'm no engineer, but the enthusiasm for the topic and the clean clarifications of these complex problems made it clear and understandable for me. I really didn't expect that when I randomly decided to watch this video.
@mattwillis32199 ай бұрын
Awesome work Jeroen! Super cool to see around an actual ASML facility, Sander was nice to describe some of the challenges that EUV poses for enabling 13nm Lithography. I'm would have loved to hear him list off a bunch of system parameters needed to perform the transform matrix for the illumination and pattern masks.
@DrBlokmeister9 ай бұрын
What do you mean by the transform matrix?
@rohan.fernando9 ай бұрын
ASML has developed an incredible suite of technologies, and this was exceptionally well explained 👍
@savclaudiu21339 ай бұрын
For the geeks around please make a video or a series with all the information from the visit, maybe in a second channel if a "specialized" series of videos might disturb main channel's metrics.
@HuygensOptics9 ай бұрын
Good idea. But let me first get a second life.😉
@pinocleen9 ай бұрын
@@HuygensOptics In the meantime, how about an AMA, with ASML? :D
@EngRMP7 ай бұрын
OMG, as an electrical engineer who has worked with radar imaging for the last 30 years, I found this absolutely fascinating. There are many similarities, although we are typically more interested in bandwidth to achieve finer resolution. At single frequencies (very low bandwidth), aperture size is the key. We use a known target and convolution to achieve a frequency dependent calibration. I would love to see the calibration process and the point spread function achieved with this machine. And, yes, it's mind boggling that this accuracy has to be achieved while all of these large components are trying to shake everything with their accelerations!!!! I don't understand why bandwidth can't be exploited to achieve better resolution...
@mctrafik9 ай бұрын
I was literally wondering yesterday about more details about lithography. And you posted this video and my burning questions were answered. Amazing. Thank you
@rodrigomartindelcampo95346 ай бұрын
That moment in 18:10 is really next to a miracle, absolutely amazing we as a species can achieve this
@hyperchannel40489 ай бұрын
Very informative and impressive. An entire 486 now fits into a previous through hole.😂 Thanks for sharing!
@faezeakbari10348 ай бұрын
I do not know how to thank you for all of these useful materials. I deeply appreciate you. Please keep going…
@milzuv15759 ай бұрын
Thanks for your vidéo and explainations. Happy New year and merry christmas.
@HuygensOptics9 ай бұрын
Same to you!
@gyrogearloose13458 ай бұрын
Most astounding! On numerous levels , , , thanks HO !
@denischikita9 ай бұрын
Content is pure gold. Automatic like
@harriehausenman86239 ай бұрын
Fantastic holiday vacation-trip to the hidden lands of ASML! Thanks also to Sander Bock for making this possible 🤗
@DrBlokmeister9 ай бұрын
Glad you enjoyed it! Huygens Optics made it into something beautiful.
@harriehausenman86239 ай бұрын
@@DrBlokmeisterAlso looks like all of you generally just had a great time 😃
@DrBlokmeister9 ай бұрын
@@harriehausenman8623 haha very true. We spent the entire day geeking out.
@spirobel2.09 ай бұрын
absolutely amazing video. even details like the light switch sound effect
@DrBlokmeister9 ай бұрын
That was indeed the cherry on top for me as well!
@SF-fb6lv8 ай бұрын
This is an incredibly SOLID presentation, subscribed!
@president29 ай бұрын
Love it so much keep it up as always 💘
@Chris_Grossman9 ай бұрын
Thank you for the excellent presentation!
@rre91218 ай бұрын
Don't worry, ASML, we'll buy all the machines for our new chip fabs. With love, The United States. But all joking aside the expressions of engineering, applied science and simple elegance are astounding. Fantastic work.
@manjsher3094Ай бұрын
The Werner Herzog of optics. Sweet.
@LouisEguchiWale8 ай бұрын
I am by no means a scientist or even an engineer really. However I am fascinated by practical science and light and your videos somehow still keep me someone who is merely a tourist of science engaged and feeling like I can follow along. Thanks so much for your videos
@marcusrauch42239 ай бұрын
Honey,wake up! Huygens optics dropped another video.
@justinloiacono69039 ай бұрын
17:17 exactly! :) , very interesting. "computational photolithography", thank you for clarifying.
@Xiaotian_Guan9 ай бұрын
Is it everyday astronaut's RD-171 engine shirt that Sander's wearing? Nice
@deviljelly39 ай бұрын
Tes it is :)
@DrBlokmeister9 ай бұрын
It definitely is! If I wasn't a lithographer, I would be a rocket scientist! A lot of things are interchangeable, such as the orientation check of a rocket or lens. Low NA end up, high NA end down. Low NA also makes for a more pointy end.
@marcof.65839 ай бұрын
Thank you for bringing this to us, average person 😄 Your videos are always interesting and informative!
@burungbaguette9 ай бұрын
Funny enough now I understood why diffraction happens when photographing object with too small of an aperture.
@PaulGeorgeedassery9 ай бұрын
This is an amazing video, Thank you !
@Epiphonication9 ай бұрын
wow, insanely interesting, thank you for the video! I'll try running some of these simulations myself :)
@mirerek9 ай бұрын
very good analysis, thank you
@aianyoung9 ай бұрын
Thank you for making these excellent videos!
@DavidKennyNZL8 ай бұрын
Thanks. mind expanding as usual.
@mrchangcooler9 ай бұрын
So, it's basically trying to tune the very specific, and to us random, way light interacts with itself as a wave in order to resolve a better image. Waves moving here and there eventually catch itself to the proper image. I can imagine the way they try and optimize every image is extremely laborious.
@HuygensOptics9 ай бұрын
Yes I guess the smaller details on every mask are Fourier transformed at some point to find the best illumination. Then probably optimize your mask again, illumination, and so on ..
@DrBlokmeister9 ай бұрын
You could not be more right. This optimization is a whole field of computational lithography or Source Mask Optimization, exactly like HugyensOptics said!
@LiamButler494549 ай бұрын
I used to draw OPC, optical process corrections, onto designs 20 years ago. Drawing mouse bits or rabbit ears to thin to thicken features, like shadow puppeteer. The addition of Fourier transform and Machine Learning to contort the drawn features such that the printed features are correct. Add other tricks like ARC antireflective coatings, or tuning of dielectric DARC, and tweeting the photo mask bake or vary the etch to get specific profiles.. Its magic.
@DrBlokmeister9 ай бұрын
@@LiamButler49454Hats off to you! The real pioneers in our field!
@sivik_7777 ай бұрын
Чел, а ты хорош, не только то что рассказал классно, ну и то что в майки с ракетным советским двигателем. Кстати привет с Планара...😊
@bobbyshen78269 ай бұрын
Thank you very much!! I am now ready to build my own lithography machine!
@DrBlokmeister9 ай бұрын
Some advice: don't use a laser-pulsed plasma light source. You'd have to hit 50 000 micron-sized tin droplets a second with 4 steel cutting lasers in series flying through vacuum with 300 km/h. That is so crazy that it will never work! 😆
@goldnutter4129 ай бұрын
Love this company and this is a great video about them and their process.. No coincidence this is the vector of our collective evolution.. specialization (a refinery of sorts) and INTERDEPENDENCY... onwards and upwards humanity ! peace is coming, nothing to fear but fear and the misunderstandings we create between each other. All in this together..
@SBA_poiko9 ай бұрын
Sander blok, what a cool guy and he watches everyday astronaut!
@DrBlokmeister9 ай бұрын
Aw thanks! :)
@frikkied26387 ай бұрын
I think some ASML ASMR will be pretty cool
@chadx82699 ай бұрын
Incredible explanation.
@heyarno8 ай бұрын
I still don't understand how a high throughput vacuum chamber is possible. But I'm impressed.
@ihmejakki27319 ай бұрын
Wonderful video!
@mythmakinglife9 ай бұрын
Невообразимо красивые визуализации дифракционных порядков. Большое спасибо) Это очень классно)
@fburton89 ай бұрын
Came for ASMR, stayed for ASML.
@tuams9 ай бұрын
I actually learned something here. Amazing.
@davidchang-yen12569 ай бұрын
Even as an engineer with a microfab background, I am right on the edge of understanding the complexity of the EUV system. I do agree that $170MM is well justified considering the level of R&D that it must have taken to produce that system (presumably multiple billions of $).
@BariumCobaltNitrog3n9 ай бұрын
We have a couple of these at work, I always wondered what was inside. Great video, would love to see more in-depth. Like how the beam is massaged into place and how do they get those wafers in and out of the vacuum so quickly? I imagine it's like an air filled dome with a small low pressure vestibule, one door OR the other opens.
@DrBlokmeister9 ай бұрын
The load locks are also still magic to me. How the hell we can get 170 wafers in and out of vacuum per hour is completely insane.
@BariumCobaltNitrog3n9 ай бұрын
@@DrBlokmeister Probably in batches. I just realized these are probably not internet-friendly questions, so thanks for replying haha
@DrBlokmeister9 ай бұрын
@@BariumCobaltNitrog3n I think if you watch the animations in this video, you can tell if it's batches or not. That being said you're right about the internet-friendliness. Fortunately I don't know too much about the load locks, so I can't give away trade secrets.
@Beregorn889 ай бұрын
I definitely would like to see the full video...
@Кот_жмотк-крутой4 ай бұрын
this is a good review!!! I have already encountered similar simulations of interference of electromagnetic waves with short wavelengths. There are several unexplored aspects in this problem, namely, the materials (chemical elements) and the thickness of the crystal structures of the diffraction slits and the mask material of the photo lithographic template itself are not taken into account.
@acswer8 ай бұрын
Sander's shirt :) @EverydayAstronaut!
@oopsiesh9 ай бұрын
great video
@JazevoAudiosurf9 ай бұрын
cool now i understood the end to end process
@mpeg2tom9 ай бұрын
5:50 RD-171 (РД-171) rocket engine t-shirt from Everyday Astronaut
@deviljelly39 ай бұрын
Excellent!!!
@harriehausenman86239 ай бұрын
MY only complaint is: Where is the 2h version of this video? Release the Huygens cut! 😄
@IsaacKripke9 ай бұрын
What an amazing opportunity! ASML makes alien technology hahaha
@PanzerschrekCN9 ай бұрын
Incredible peace of technology!
@lennoxbaumbach39018 күн бұрын
Hope, Zeiss gives you an invite next.
@ledescendantdeuler69277 ай бұрын
WOOOOOOOOOOOOOOOW I LOVE THISS!!!! ANY BOOK RECS ????
@adamh12289 ай бұрын
very cool, thanks for this video
@jackallread7 ай бұрын
Greats for the great video!!
@Reiermannundsoehne877 ай бұрын
I miss a reference to Carl Zeiss where all the optics of the steppers are actually designed an manufactured - proud member of the HiNA EUV Illumination team.
@DrBlokmeister7 ай бұрын
You guys are absolutely incredible! The wizardry you go though to get good optics that meet our insane constraints is mind blowing. I had the pleasure of visiting the low-NA illumination cleanroom at Oberkochen once. Absolutely incredible!
@Pastisas9 ай бұрын
Great video! Would you recommend pursuing a career there?
@HuygensOptics9 ай бұрын
Well of course. I actually applied for a job at ASML about 30 years ago. However they did not respond very quickly, so by that time they got back, I already had an offer from Philips Electronics I could not refuse ;-). But if I had the same options now, I would definitely choose differently.
@DrBlokmeister9 ай бұрын
It is a very large company with all its perks and downsides. You would have to like that. Otherwise the technology there is amazing. The stuff we do at ASML is bizarre. Everything has to be accurate on the nanometer or even picometer scale, so everything matters. That is what makes my job fun.
@jamescollier39 ай бұрын
that industry is brutal. talk to people in it first. great money but hard long hours, all the time
@diegogmx20009 ай бұрын
@@DrBlokmeister the hidden hand of VDL helps quite a lot i figure
@diegogmx20009 ай бұрын
@@DrBlokmeister also in terms of accuracy, how do you deal with thermal expansion? even if using super invar for everything looks to me like you need an extremely accurate temperature control on the whole machine, and in vacuum nontheless with 12 dof stages accelerating like cannonballs
@your_utube9 ай бұрын
amazing
@enduroman28347 ай бұрын
"computers are just stones we tricked into thinking using electricity"
@Tony468298 ай бұрын
Maybe one day we may figure out how to use even smaller wavelengths of light to make even smaller details on a wafer, maybe even use X-rays or Gamma rays. Not sure how practical that could ever be, seeing we’re already getting close to the size of atoms, but more precision is always amazing
@HuygensOptics8 ай бұрын
Making x-ray or gamma ray optics is quite a bit more challenging than for EUV.
@Martinit06 ай бұрын
@@HuygensOpticsWell, the synchrotron guys know how to deal with x-rays
@Mr.SharkTooth-zc8rm4 ай бұрын
Wow! 🤯
@nicolashuot9 ай бұрын
Thank you very much for this great introduction to the wafer scanner (or is it called stepper?)
@HuygensOptics9 ай бұрын
Both are okay, modern machines both step between different exposure fields and scan through an individual field.
@phyarth80829 ай бұрын
ASML Twins can approximately forty-million lines of program code. To synchronize ballet music with dance requires less effort :)
@회기-c3w9 ай бұрын
Uitstekend 😊
@djdongurpreetsingh53966 ай бұрын
❤❤❤good job man love you from DJ Don Pro Amritsar punjab india
@GNARGNARHEAD9 ай бұрын
fascinating, thanks
@L1m3r8 ай бұрын
If you want to dive deeper into those ASML machines I recommend "@"'s playlist on the topic: kzbin.info/aero/PLKtxx9TnH76RYHY7L1YzEHEQJJ01GF-VF
@Interelectronix9 ай бұрын
Great Video. What is the software you used to create the animations? They look amazing
@HuygensOptics9 ай бұрын
See video description.
@Danilmorss9 ай бұрын
Thank you, very interesting!
@markusperscheid42786 ай бұрын
Hello, please can you tell me if I have a single light source which has for example 565 nm peak. Is there a pattern (points of energy density) when the wave is colabsing on a flat surface? Especially for every wavelenght different. ? Thank you very much .
@turun_ambartanen9 ай бұрын
The Mask in the EUV machine animation moves all the time. Why? Obviously the wafer moves, because each die is illuminated separately. But why does the mask move? It it for multiple patterning? e.g. vertical and horizontal lines separately in combination with optimized illumination to etch out even more performance? btw I love the sound effects at 22:30 ("that one special moment in the life of a photosensitive layer")
@DrBlokmeister9 ай бұрын
Great question! You can compare it to the way we print newspapers. The paper is moving, but the printer roll is also moving. If the printer roll would stand still, the image would fade. The printer roll has to match the speed of the newspaper, even if the contact area between the paper and roll stays in the same physical place. The same is true for our system. The mask has to follow the wafer so that the image doesn't fade. The 'contact area' is the light beam connecting the mask (roll) to the wafer (newspaper). Matching their speed to very high precision is crucial if you want to maintain nanometer accuracy. Does that make sense?
@HuygensOptics9 ай бұрын
The reason for scanning is that it's very hard to illuminate the whole area at once with the resolution required. It's just not feasible to make the optics that can do that. But it is feasible to do this within a narrow area. So that is why they both step between chips and scan over each individual chip area.
@turun_ambartanen9 ай бұрын
@@DrBlokmeister Thank you, that makes sense. How big is the contact area (to borrow your analogy)? Is one slice of the mask illuminated at once, or do you need to scan in both x and y direction? Or in other words, if I look at a big NVidia die, would that be scanned once from left to right for one photolayer mask, or would it be scanned from left to right multiple times to built up multiple rows of illumination?
@DrBlokmeister9 ай бұрын
@@turun_ambartanen I can't comment on the precise field size, but it's 26mm in one direction and a few millimeters in the other for EUV. For other photolithography types its 26mm by a larger size. The size of a die (or a full newspaper page in the analogy) is 26mm x 32mm. Chip makers optimize the layout so that as many chips as possible fit on a wafer. I guess they at least try to use as much as the 26mm width. Then it's nice if they could make the length 16mm so they can fit two chips on one mask. I measured my 6900XT die, and that one is too big to put two on one mask.
@turun_ambartanen9 ай бұрын
@@DrBlokmeister Thank you very much!
@soso-zz9qf7 ай бұрын
I'm applying for a photolithogrophy/microfabs job at my uni's syncrotron... I'm really hoping i get it
@alexeyl229 ай бұрын
Please explore in detail how destination image dictates what mask and source light shape should look like )). Hard problem indeed, but comp simulation should help visualizing it.
@sensorer8 ай бұрын
Hey! I'm a physics undergrad, currently mostly focused on QM. I am interested in the physics behind quantum measurements and one of the sides I want to approach it from is polarization. There are a lot of explanations of WHAT polarizers do, but I don't know HOW polarizers do what they do. I know that it is probably not well established, since if it was, there probably would not be a measurement problem in QM, but maybe you could point to some resouce diving into that
@HuygensOptics8 ай бұрын
So there is a lot of nonsense around polarizers, especially those experiments demonstrate that they prove "spooky QM phenomena". Basically, this is complete nonsense, arising from the incorrect assuming that the actual EM field is quantized. Polarizers are not pure filters having a I*cos2(theta) attenuation on quanta. They actually actually change the polarization direction of an incoming field according to this distribution. The best way to visualize this from microwaves and linear line grids as polarizers. A conductive grid of lines can effectively block linearly polarized radiation at 90 degrees, due to the fact that the grids conduct electricity in one spatial direction and not in the other. So the resulting field afterwards is 0. If you add another grid before the polarizer at 45 degrees, it will act as an antenna and will create a new field, that does have a field component in the direction of the first polarizer described. And therefore, a fraction of the radiation now passes both filters. That is all there is to it. Just classical wave theory, no QM required.
@phonotical9 ай бұрын
Are wavelength interferences less frequent with narrower bandwidths, say from a monochromatic source
@DrBlokmeister9 ай бұрын
Interference is always present, no matter the wavelength difference of the multiple waves. However, as the wavelength difference becomes larger, the phase relation is no longer constant over time. The larger the difference, the shorter the coherence time. In lithography we want different sources to be incoherent, while the interfering light rays are coherent. My mind works in the Abbe sum of incoherent sources approach, which takes this incoherence into account.
@phonotical9 ай бұрын
@@DrBlokmeister thanks for the information!
@gijbuis9 ай бұрын
An Airbus 350 widebody costs between $320 million and $370 million. So if you can buy such a state of the art chip machine for only $170 million from ASML and rocket to the top of the chip manufacturing industry, that's pretty cheap at the price. Speaking of rockets - the Block 1B version of SLS, to be used starting with Artemis 4, will initially cost $2.5 billion per launch (compared to only $97 million for a SpaceX Falcon Heavy launch).