Lecture 39 (CHE 323) Lithography Process Overview

[@黄晓晟]

Q1: reproduce the pattern CD required; transparent to the laser beam to expose the photoresist; good adhesion of photoresist to substarte; low cost; envioronment friendly... Q2: photo, can be removed by the developer; resist, resist to the etching Q3: The adhesion promoter is a kind of vapor that can quickly adhere to the silica surface, so that the H2O has no place to adhere Q4: edge bead exists in the edge of the waver, it occurs because the direcion of the surface tension changes from vertical direciton to horizontal Q5: removing the solvent that used to remove the particles and contaminants. Q6: positive photoresist: the part exposed to the light will be removed by developer; negative photoresist...

[@ChrisMack]

A PDFcopy of all the slides in this course are available at: www.lithoguru.com/scientist/CHE323/course.html

[@shepherdsambaza8744]

Thank you for the informative video, Prof!

[@deepraj1231]

Thanks a lot for posting these lectures, indeed very helpful.

[@071973ful]

Thank you professor for very informative information

[@monanafari5050]

amazing videos!!!

[@yongxianglim56]

Thank you so much for this video! It was very informative

[@mohammedhasan6522]

is there any possibility to get the slides ? it is very helpfull