[Photolithography Part3] Alignment & Overlay

  Рет қаралды 18,354

SemiSlides

SemiSlides

Күн бұрын

Пікірлер: 15
@SemiSlides
@SemiSlides Жыл бұрын
Is this the real life, or is this just fantasy? Caught in a landslide of views and likes without a single comment in here! 🎵🏔 Hit the like if you're here making history with us. Don't be shy, drop a 'hello' or share your thoughts... unless you're a transistor, then we understand the silence. 😉🏔
@zhiqiangtang2731
@zhiqiangtang2731 Жыл бұрын
Fantastic! Hope you can post more and more ! Really appreciate!
@SemiSlides
@SemiSlides Жыл бұрын
Thanks for your energizing words! Each new subscriber supercharges my motivation, inspiring me to post more electrifying content. If you're enjoying these semiconductor sagas, why not share them with your fellow silicon pioneers? Let's expand this circuit of knowledge and fun together!
@sajjadhossain3947
@sajjadhossain3947 Жыл бұрын
True Gem. Thanks for the slides
@SemiSlides
@SemiSlides Жыл бұрын
Thrilled you think our slides are a true gem! In the intricate world of photolithography, where alignment and overlay are everything, it's great to know we're 'aligned' with your interests. Thanks for 'overlaying' your support - stay connected for more electrifying insights!
@ngzhenbin8262
@ngzhenbin8262 2 ай бұрын
Very helpful video, thanks for uploading!
@Stevenebe462
@Stevenebe462 7 ай бұрын
Thanks for the amazing video. I am wondering if ASML Orion system can use other company’s alignment mark design? E.g can 2000i use Intel’s own alignment mark? Thanks.
@SemiSlides
@SemiSlides 7 ай бұрын
Thank you for the great feedback and for watching the video! Regarding your question about the ASML Orion system and the use of Intel's alignment marks, that's a great query. However, our channel doesn't disclose any information that could infringe on a company's confidential details or trade secrets. In general, ASML systems are designed to be quite versatile, but specific implementations involving proprietary designs like Intel's alignment marks would fall into the category of confidential information. Thanks for understanding, and keep exploring the fascinating world of semiconductors! 😊
@Stevenebe462
@Stevenebe462 7 ай бұрын
@@SemiSlides also curious what is the difference between alignment mark and overlay mark? in terms of functionality
@SemiSlides
@SemiSlides 5 ай бұрын
Hey there, Silicon Pioneer! Great question! Let's dive into the differences between alignment marks and overlay marks from a functionality perspective, especially in the context of ASML Twinscan systems. Alignment Marks: These are used to align the reticle (the photomask) with the wafer. Given that photolithography equipment is expensive, maintaining continuous operation on the exposure side is the top priority. Therefore, the alignment measurement on the measure side must be completed in less time than it takes for the exposure side to process a single wafer. This means the system can't align every single field on the wafer individually. Instead, it focuses on aligning the entire wafer with the entire reticle to keep things running smoothly and efficiently. Overlay Marks: These come into play after the exposure and, unlike alignment marks, the process doesn't affect the expensive ASML system's productivity. As a result, a separate overlay measurement system can be used to thoroughly and massively measure the overlay for each individual exposure field. This helps identify any misalignment across all the exposure fields and provides detailed feedback to ensure better alignment for future exposures. And hey, apologies for the delay in getting back to you. Sometimes, the notification system likes to take its sweet time. Thanks for your patience! Keep those awesome questions coming! Cheers, Semi Sherpa 🌟
@jrunsa1216
@jrunsa1216 10 ай бұрын
Good job
@SemiSlides
@SemiSlides 10 ай бұрын
Thanks for tuning into our video on Alignment & Overlay, which, to our surprise, turned out to be the main attraction on my channel. It's like finding a hidden gem in the complex world of semiconductors-unexpected but brilliant. Your support really amps up our motivation, proving that a bit of humor and wit can resonate well beyond the circuits. Cheers to more discoveries that make us smile, intentionally or not!
@ElijahSamsonWiltonChen
@ElijahSamsonWiltonChen 3 ай бұрын
very good, thx. but the ai voice is pretty bad
@justhujia
@justhujia Жыл бұрын
Very helpful to me, thanks
@SemiSlides
@SemiSlides Жыл бұрын
Thrilled to hear that our 'Alignment & Overlay' video sparked some silicon joy in your day! Stay tuned for more enlightening content. Here's to keeping our circuits aligned and our knowledge overlaid! 😊👨‍🔬💡
[Photolithography Part2]  Imaging & RET
1:15:52
SemiSlides
Рет қаралды 3,1 М.
[Photolithography Part1]  Track (Coating & Develop)
1:20:23
SemiSlides
Рет қаралды 9 М.
We Attempted The Impossible 😱
00:54
Topper Guild
Рет қаралды 56 МЛН
The evil clown plays a prank on the angel
00:39
超人夫妇
Рет қаралды 53 МЛН
Chain Game Strong ⛓️
00:21
Anwar Jibawi
Рет қаралды 41 МЛН
小丑女COCO的审判。#天使 #小丑 #超人不会飞
00:53
超人不会飞
Рет қаралды 16 МЛН
How an ASML Lithography Machine Moves a Wafer
16:15
Asianometry
Рет қаралды 489 М.
How Extreme Ultraviolet Lithography works | Part 1/3
18:51
ZEISS Group
Рет қаралды 159 М.
Life of a wafer
9:16
CeNSE IISc
Рет қаралды 2,6 М.
[Photolithography Par4] CD Measurement & Control
1:19:15
SemiSlides
Рет қаралды 6 М.
Why The World Relies On ASML For Machines That Print Chips
18:40
[Thin Film Part1]  Stress and Strain
39:18
SemiSlides
Рет қаралды 3,4 М.
Speedrunning 30yrs of lithography technology
46:07
Breaking Taps
Рет қаралды 983 М.
[Photolithography Part6]  Photomask (1 of 2)
1:00:42
SemiSlides
Рет қаралды 6 М.
[Photolithography Part5]  Multiple Patterning Technology (MPT)
2:05:50
Imaging at ASML
23:40
Huygens Optics
Рет қаралды 129 М.
We Attempted The Impossible 😱
00:54
Topper Guild
Рет қаралды 56 МЛН