PDF copies of all the slides in this course are available at: www.lithoguru.com/scientist/CHE323/course.html
@wutony73632 жыл бұрын
Hi Dr.Chris Mack What is the role of a silicon carbide straight-through tube in a horizontal furnace?
@hameleon898 жыл бұрын
Thank you sir for your explanation!
@sjms94307 жыл бұрын
Do we need to perform thermal oxidation before every lithographic process? Will SiO2 layer provide better adhesive to the photo resist layer?
@ChrisMack7 жыл бұрын
No, we certainly do not need to perform thermal oxidation before every lithography step. We can perform lithography an any substrate. We may have to prepare the substrate using an adhesion promoter, or possibly an antireflection coating before applying the photoresist.
@sjms94307 жыл бұрын
Thanks a lot for your reply :) Your videos are really good
@sjms94307 жыл бұрын
Suppose, While doing oxidation we are growing SiO2 layer on both sides (top and bottom). During buffer oxide etching of top oxide for ion implantation, how can we protect the back oxide from getting etched?
@ChrisMack7 жыл бұрын
I think the most common approach would be to coat the backside with photoresist.
@sjms94307 жыл бұрын
Thankyou .
@tejshah60009 жыл бұрын
very slow
@azscott87378 жыл бұрын
go wherever you came from and you will find a person speaks fast
@aboodz8 жыл бұрын
Professor Mack said most students prefer playing the videos at 1.5x, so do I. Helps, but sometimes you might need to slow down and rewind a bit