Well Proximity Effect - English Version

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Analog Layout Laboratory

Analog Layout Laboratory

Күн бұрын

Пікірлер: 63
@tamilabhivlog9473
@tamilabhivlog9473 2 жыл бұрын
Thanks naba, never forget WPE in my life
@pradeepcb8209
@pradeepcb8209 6 жыл бұрын
Thank you bro...Its in need for all guys who r really preparing for interview and also working guys will be not knowing about the concept's.
@analoglayout
@analoglayout 6 жыл бұрын
thx for ur comment
@nishithnibrash2473
@nishithnibrash2473 2 жыл бұрын
Thank you. It was impeccable.
@Everydaykaen
@Everydaykaen 7 күн бұрын
Nice for my interview next week 😅
@sanjaytumati
@sanjaytumati 4 жыл бұрын
When you say stress around 5:30, do you mean mechanical stress? How is mechanical stress caused by excess ions? I can see how excess ions change the doping of the S/D regions in the transistor and change its Vt/mobility etc. But how does it cause mechanical stress? Thanks
@kashinaths1994
@kashinaths1994 5 жыл бұрын
Really it's helpful for me thank you 😊
@ayeshafarheen9559
@ayeshafarheen9559 2 жыл бұрын
Thank you sir. Very useful
@harinarayan7003
@harinarayan7003 9 ай бұрын
nice one👏
@manishasutar8701
@manishasutar8701 5 жыл бұрын
if photoresistor is scattering my ions then why we will not remove that before ion implantation? basically below that one oxide layer is present to select particular area for ion implantation
@kshitijsingh636
@kshitijsingh636 5 жыл бұрын
nicely explained ...thanks
@hamzaatiq203
@hamzaatiq203 4 ай бұрын
can we simulate this effect?
@analoglayout
@analoglayout 4 ай бұрын
Yes you can
@ayeshafarheen9559
@ayeshafarheen9559 2 жыл бұрын
For which layer are we doing ion implantation
@analoglayout
@analoglayout 2 жыл бұрын
Source & drain
@suryaprabhakarthota1182
@suryaprabhakarthota1182 5 жыл бұрын
Super explanation sir
@siddeshbagali13
@siddeshbagali13 6 жыл бұрын
Please add and explain some more concepts, very helpful source
@dosapatikrishnakumar6569
@dosapatikrishnakumar6569 6 жыл бұрын
Hi . You said ion implantation done with 7 degree angle.. then both edges will effect.. but if we done with 90 degrees then there is no chance to hit the edges then there is no chance to WPE? WHY we not do with 90 degrees ion implantation? If do what happened?
@analoglayout
@analoglayout 6 жыл бұрын
90 degree implantation also will give other problems , so after doing many research they found , 7 degree implantation is better then others , but its having only one problem WEP , so they are following that
@dosapatikrishnakumar6569
@dosapatikrishnakumar6569 6 жыл бұрын
@@analoglayout k but I heard for source and drain also we do 7 degrees.. depth of the well is high compare to source and drain regions.. how control depth.. ?
@dosapatikrishnakumar6569
@dosapatikrishnakumar6569 6 жыл бұрын
Bro what are the problems.. using 90 degrees ? If not possible to share here then mail me.. thanks
@analoglayout
@analoglayout 6 жыл бұрын
read , art of analog layout ... book . . . .
@yuvrajsingh-oy7op
@yuvrajsingh-oy7op 6 жыл бұрын
@@dosapatikrishnakumar6569 See if ion implantation is done at 90 degree angle, a issue will comeup known as Channeling effect (penetration of ions to undesired depths), so they tilt the beam 7-9 degrees to overcome this effect. if you want to study in details go through art of analog layout by Alan Hastings.
@ismartjayam
@ismartjayam 6 жыл бұрын
sir will u plz upload SHALLOW TRENCH ISOLATION AND DEEP N-WELL
@analoglayout
@analoglayout 6 жыл бұрын
venkat , i've few doubts in this 2 topic's , so it will take time , i know the concepts , but i've make understood that to everyone , so i need time , sorry for the delay
@gowri1881
@gowri1881 Жыл бұрын
How does effect is only on sides? It can be on all sides also?
@analoglayout
@analoglayout Жыл бұрын
All the sides
@bipulpal7719
@bipulpal7719 6 жыл бұрын
nice ....thank you.... want video on short channel effects
@analoglayout
@analoglayout 6 жыл бұрын
already WPE , i posted , STI , LOD , is left .... as soon il post
@manojsremark4436
@manojsremark4436 5 ай бұрын
@@analoglayout what is purpose of ion implanation process & why??, and why ion implanatation is doing in only 7 degree angle??
@mohammedafzal534
@mohammedafzal534 6 жыл бұрын
Can u pls list the second order effects? Whether we have 1st order too in analog layout?
@analoglayout
@analoglayout 6 жыл бұрын
WPE,LOD , STI ,DIBL , this topic is 2nd order , i will try to post asap
@mahendarkodimella323
@mahendarkodimella323 6 жыл бұрын
Plz upload video on electro static discharge
@analoglayout
@analoglayout 6 жыл бұрын
ESD will be available soon
@sampathkumarmatlapudi8250
@sampathkumarmatlapudi8250 6 жыл бұрын
its vary the vt of the n mos or not
@analoglayout
@analoglayout 6 жыл бұрын
it will vary the vt , for all mos
@sampathkumarmatlapudi8250
@sampathkumarmatlapudi8250 6 жыл бұрын
but in video u are mentioned only pmos only thats why im asking
@analoglayout
@analoglayout 6 жыл бұрын
for easy drawing , i chosen nmos , wpe will affect all the device which s near by well boundary , i.e nmos , pmos , resister , capacitor , all the active and passive devices
@suryanarayan2406
@suryanarayan2406 6 жыл бұрын
Hi... if you observe the diagram you are doing ion implantation with an angle right, in that scenario the transistor which are placed left corner side only affected.. how will the right corner transistor affected?
@analoglayout
@analoglayout 6 жыл бұрын
ion implantation done by 7 degree angle , so both corner will be affected , i cant able to draw exact diagram ,
@mohammadaslamalam5413
@mohammadaslamalam5413 4 жыл бұрын
Is WPE also will effect NMOSES if it places near to WELL ?
@analoglayout
@analoglayout 4 жыл бұрын
Ys
@swathikilaru2082
@swathikilaru2082 4 жыл бұрын
Hi sir, How Vt will change -10% based on scattered ions can you please explain
@analoglayout
@analoglayout 4 жыл бұрын
Vt variations will be thr , for ex 10% , it may even more High or low , it's just a random %
@borncreative671
@borncreative671 5 жыл бұрын
sir make a video on ESD
@analoglayout
@analoglayout 5 жыл бұрын
Sure ... I'll do
@jathinc2230
@jathinc2230 5 жыл бұрын
WILL THE Vth OF MY MOSFET DEPENDS ON TRANSISTOR WIDTH AND LENGTH?
@analoglayout
@analoglayout 5 жыл бұрын
VT depand on , so many things . L , W , poly resistance , cgb , doping on poly , etc
@gangavarampavan9437
@gangavarampavan9437 4 жыл бұрын
can you please upload videos on internal structure of end cap cells,tap cells, decap cells
@analoglayout
@analoglayout 4 жыл бұрын
Lemme try , if available
@pranalijadhav7774
@pranalijadhav7774 6 жыл бұрын
Can you please explain in detail how VT of the transistor varies?
@analoglayout
@analoglayout 6 жыл бұрын
watch body bios video , u will get some idea
@pranalijadhav7774
@pranalijadhav7774 6 жыл бұрын
@@analoglayout OK. Thank u
@analoglayout
@analoglayout 6 жыл бұрын
your welcome
@rajasekharreddy6891
@rajasekharreddy6891 5 жыл бұрын
Sir plzzz upload more related to layout sire
@sahajapinky1385
@sahajapinky1385 6 жыл бұрын
hi sir if you don't mind can you please explain deep nwell process also
@analoglayout
@analoglayout 6 жыл бұрын
IL do that
@Rebecca_eenagaraniki_emaindi
@Rebecca_eenagaraniki_emaindi 5 жыл бұрын
Can you please tell me in detailed how the scattered ions are affecting the nearby device in terms of charge carries.
@sanjaytumati
@sanjaytumati 4 жыл бұрын
The ions are what is causing the Doping of either the substrate or the Source/Drain diffusion. If not for WPE, the doping would be uniform. What scattered ions are doing is causing non-uniformity in the doping which affects the specifications (Vt, KP) of the transistor sections that are too close to the well.
@youthcentral493
@youthcentral493 6 жыл бұрын
cmos fabracation vanum sir
@analoglayout
@analoglayout 6 жыл бұрын
next video is ur video only bro ... im working on it
@bhavanireddy1152
@bhavanireddy1152 6 жыл бұрын
explain in cross section view ........
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