Thank you bro...Its in need for all guys who r really preparing for interview and also working guys will be not knowing about the concept's.
@analoglayout6 жыл бұрын
thx for ur comment
@nishithnibrash24732 жыл бұрын
Thank you. It was impeccable.
@Everydaykaen7 күн бұрын
Nice for my interview next week 😅
@sanjaytumati4 жыл бұрын
When you say stress around 5:30, do you mean mechanical stress? How is mechanical stress caused by excess ions? I can see how excess ions change the doping of the S/D regions in the transistor and change its Vt/mobility etc. But how does it cause mechanical stress? Thanks
@kashinaths19945 жыл бұрын
Really it's helpful for me thank you 😊
@ayeshafarheen95592 жыл бұрын
Thank you sir. Very useful
@harinarayan70039 ай бұрын
nice one👏
@manishasutar87015 жыл бұрын
if photoresistor is scattering my ions then why we will not remove that before ion implantation? basically below that one oxide layer is present to select particular area for ion implantation
@kshitijsingh6365 жыл бұрын
nicely explained ...thanks
@hamzaatiq2034 ай бұрын
can we simulate this effect?
@analoglayout4 ай бұрын
Yes you can
@ayeshafarheen95592 жыл бұрын
For which layer are we doing ion implantation
@analoglayout2 жыл бұрын
Source & drain
@suryaprabhakarthota11825 жыл бұрын
Super explanation sir
@siddeshbagali136 жыл бұрын
Please add and explain some more concepts, very helpful source
@dosapatikrishnakumar65696 жыл бұрын
Hi . You said ion implantation done with 7 degree angle.. then both edges will effect.. but if we done with 90 degrees then there is no chance to hit the edges then there is no chance to WPE? WHY we not do with 90 degrees ion implantation? If do what happened?
@analoglayout6 жыл бұрын
90 degree implantation also will give other problems , so after doing many research they found , 7 degree implantation is better then others , but its having only one problem WEP , so they are following that
@dosapatikrishnakumar65696 жыл бұрын
@@analoglayout k but I heard for source and drain also we do 7 degrees.. depth of the well is high compare to source and drain regions.. how control depth.. ?
@dosapatikrishnakumar65696 жыл бұрын
Bro what are the problems.. using 90 degrees ? If not possible to share here then mail me.. thanks
@analoglayout6 жыл бұрын
read , art of analog layout ... book . . . .
@yuvrajsingh-oy7op6 жыл бұрын
@@dosapatikrishnakumar6569 See if ion implantation is done at 90 degree angle, a issue will comeup known as Channeling effect (penetration of ions to undesired depths), so they tilt the beam 7-9 degrees to overcome this effect. if you want to study in details go through art of analog layout by Alan Hastings.
@ismartjayam6 жыл бұрын
sir will u plz upload SHALLOW TRENCH ISOLATION AND DEEP N-WELL
@analoglayout6 жыл бұрын
venkat , i've few doubts in this 2 topic's , so it will take time , i know the concepts , but i've make understood that to everyone , so i need time , sorry for the delay
@gowri1881 Жыл бұрын
How does effect is only on sides? It can be on all sides also?
@analoglayout Жыл бұрын
All the sides
@bipulpal77196 жыл бұрын
nice ....thank you.... want video on short channel effects
@analoglayout6 жыл бұрын
already WPE , i posted , STI , LOD , is left .... as soon il post
@manojsremark44365 ай бұрын
@@analoglayout what is purpose of ion implanation process & why??, and why ion implanatation is doing in only 7 degree angle??
@mohammedafzal5346 жыл бұрын
Can u pls list the second order effects? Whether we have 1st order too in analog layout?
@analoglayout6 жыл бұрын
WPE,LOD , STI ,DIBL , this topic is 2nd order , i will try to post asap
@mahendarkodimella3236 жыл бұрын
Plz upload video on electro static discharge
@analoglayout6 жыл бұрын
ESD will be available soon
@sampathkumarmatlapudi82506 жыл бұрын
its vary the vt of the n mos or not
@analoglayout6 жыл бұрын
it will vary the vt , for all mos
@sampathkumarmatlapudi82506 жыл бұрын
but in video u are mentioned only pmos only thats why im asking
@analoglayout6 жыл бұрын
for easy drawing , i chosen nmos , wpe will affect all the device which s near by well boundary , i.e nmos , pmos , resister , capacitor , all the active and passive devices
@suryanarayan24066 жыл бұрын
Hi... if you observe the diagram you are doing ion implantation with an angle right, in that scenario the transistor which are placed left corner side only affected.. how will the right corner transistor affected?
@analoglayout6 жыл бұрын
ion implantation done by 7 degree angle , so both corner will be affected , i cant able to draw exact diagram ,
@mohammadaslamalam54134 жыл бұрын
Is WPE also will effect NMOSES if it places near to WELL ?
@analoglayout4 жыл бұрын
Ys
@swathikilaru20824 жыл бұрын
Hi sir, How Vt will change -10% based on scattered ions can you please explain
@analoglayout4 жыл бұрын
Vt variations will be thr , for ex 10% , it may even more High or low , it's just a random %
@borncreative6715 жыл бұрын
sir make a video on ESD
@analoglayout5 жыл бұрын
Sure ... I'll do
@jathinc22305 жыл бұрын
WILL THE Vth OF MY MOSFET DEPENDS ON TRANSISTOR WIDTH AND LENGTH?
@analoglayout5 жыл бұрын
VT depand on , so many things . L , W , poly resistance , cgb , doping on poly , etc
@gangavarampavan94374 жыл бұрын
can you please upload videos on internal structure of end cap cells,tap cells, decap cells
@analoglayout4 жыл бұрын
Lemme try , if available
@pranalijadhav77746 жыл бұрын
Can you please explain in detail how VT of the transistor varies?
@analoglayout6 жыл бұрын
watch body bios video , u will get some idea
@pranalijadhav77746 жыл бұрын
@@analoglayout OK. Thank u
@analoglayout6 жыл бұрын
your welcome
@rajasekharreddy68915 жыл бұрын
Sir plzzz upload more related to layout sire
@sahajapinky13856 жыл бұрын
hi sir if you don't mind can you please explain deep nwell process also
@analoglayout6 жыл бұрын
IL do that
@Rebecca_eenagaraniki_emaindi5 жыл бұрын
Can you please tell me in detailed how the scattered ions are affecting the nearby device in terms of charge carries.
@sanjaytumati4 жыл бұрын
The ions are what is causing the Doping of either the substrate or the Source/Drain diffusion. If not for WPE, the doping would be uniform. What scattered ions are doing is causing non-uniformity in the doping which affects the specifications (Vt, KP) of the transistor sections that are too close to the well.
@youthcentral4936 жыл бұрын
cmos fabracation vanum sir
@analoglayout6 жыл бұрын
next video is ur video only bro ... im working on it