Antenna effect in VLSI Fabrication | Plasma Induced Gate Oxide Damage | Plasma Etching

[@wellnesswithsaurav9244]

Thanks for putting these real world vlsi concepts!!

[@TeamVLSI]

Thanks Saurav! Keep learning!!!

[@ShresthaSingh12]

Well explained!!

[@TeamVLSI]

Thanks Shrestha. Keep watching!

[@saurabhtomar3494]

very well explained , please upload some videos related to short channel effects in mosfet.

[@TeamVLSI]

Thanks a lot Saurabh.

[@sunnygupta6438]

Hi Sir, As you explain here during plasma etching positive charge accumulated to metal plates. So why positive charge ? it could be negative as well because plasma is hot ionized gas and always neutral (containing equal no. of positive and negative ions). please explain I am little bit confuse.

[@TeamVLSI]

Hi Sunny, Thanks for asking a good question. I think the question might arise in your mind only due to the reason you missed the electric filed direction between the RF Electrode and the wafer. The strong electric field is toward the wafer, so only +ve ions will strike the metal. The figure-4 of the following article will help you to understand it clearly. www.teamvlsi.com/2020/05/antenna-effect-in-vlsi-design.html

[@sunnygupta6438]

Thank you sir

[@jetli4696]

very detail ！！！

[@TeamVLSI]

Hi Jet li, Thank you!

[@AnilKumar-hl7oq]

nice