At 19:30, you told that there are 4 collector around standard cell and minority charge can be collected to avoid latch up, but I didn't understand how did the tap cells present above and below standard cell can collect minority charge carrier because tap cell's p substrate and n well is not overlapping with p substrate and n well of the standard cell. Thanks
@TeamVLSI3 жыл бұрын
Hi Raj, Thanks for your feedback. I will provide a better elaboration soon.
@venkatnarayana20683 жыл бұрын
could you please tell guard band importance in sense amplifier
@AnilKumar-hl7oq5 жыл бұрын
informative and satisfied !! osm
@TeamVLSI5 жыл бұрын
Thanks Anil :)
@anhtuan20864 жыл бұрын
English is not the negative language of me, If you can putting sub for video, it helps me very much is clear. thank you!
@TeamVLSI4 жыл бұрын
Thank you! We will try.
@sth4someone9125 жыл бұрын
Could you please prepare some videos on ESD/IO rings and how to place them in ICC? Thanks
@TeamVLSI5 жыл бұрын
Yes sure, But some time later.
@sb67015 жыл бұрын
Good information, thank you. But I have a query can u please explain. Latchup is forming bcz of tap resistance also and in below 65nm the std cell layout is without tap cells... then below 65nm how latchup formed and in above 65nm how tapcells prevents latchup.. sorry if I’m asking anything wrong.
@TeamVLSI5 жыл бұрын
Thanks, Bindu Latch-up is triggered because of the high well and Substrate resistance (low doped regions) [Not because of tap cells]. This resistance caused a sufficient voltage drop to make emitter-base junction forward bias. Because of tap cells in lower technology, the flow of minority carriers gets dispersed, which reduce the voltage drop across base-emitter junction and further prevent turning on the BJT. In larger technology, generally we use guard rings.
@sb67015 жыл бұрын
Thanks for your reply. :)
@mohammedafzal5345 жыл бұрын
Good explanation! But i have a question you shown guarding in cross sectional view by placing n+ or p+ by the sides of dissuions,can't we have n+ or p+ at the bottom along with sides? May interviewer will accept it or not if we shown like that?
@TeamVLSI5 жыл бұрын
Could you please ask your question in more clear way. Sorry I have not got the question clearly.
@mohammedafzal5345 жыл бұрын
How will you represent the guarding in cross sectional view?
@TeamVLSI5 жыл бұрын
Hi Afzal, Pause the video at 6:12 and see the image of bottom left side, that is the cross sectional representation of guard ring.
@mohammedafzal5345 жыл бұрын
Ya sir i watched that one, that's why i got a doubt. In layout we surround the device with guarding but in cross sectional view you shown the guarding in between pmos & nmos only right.Is it correct to show the guarding like that, i don't know to confirm it i am asking. Please clarify it sir
@TeamVLSI5 жыл бұрын
Hi Afzal Actually, there are various ways to put the guard rings, I have shown there only a way how can we prevent Latch-up using guard ring in an inverter circuit. In fact you can put the guard ring all around your circuit, between the circuit and there are many more techniques.
@saijagadeesh17083 жыл бұрын
Sorry sir , I didn't get much clarity about how exactly these well tap cell will prevent latch up issue?
@TeamVLSI3 жыл бұрын
Hi Sai, Thanks, Let me try to make it clear. Try to understand this in the simplest way as: 1. To prevent the latchup we need to connect the nwell to VDD and pwell to VSS. 2. Tap cells are doing this job only.
@shyamnair89123 жыл бұрын
Hi Sir,, How is the TAP2TAP distance calculated? I see in different technology the TAP2TAP distance is different.. How is this calculation made?
@TeamVLSI3 жыл бұрын
Hi Shyam, Yes it is technology node dependent parameters. Generally while developing a new node, these are characterized and passed to designer.
@ashmeetjheeta43234 жыл бұрын
Hi I have a query what is the difference between contact and via ?
@TeamVLSI4 жыл бұрын
Hi Ashmeet, Really a good question! Basically the contacts is a material used to connect the diffusion and the lowest metal layer or Poly to lowest metal. Whereas the via is used to connect the metals. like M1 to M2 , Via1 is used. M2 to M3, Via2 is used.
@tanimadas20143 жыл бұрын
@@TeamVLSI Why we can't use guard ring in standard cell?
@ayushdhamani12383 жыл бұрын
How welltap is actually preventing latchup ? That is not yet clear .
@TeamVLSI3 жыл бұрын
Hi Ayush, Thanks, Let me try to make it clear. Try to understand this in the simplest way as: 1. To prevent the latchup we need to connect the nwell to VDD and pwell to VSS. 2. Tap cells are doing this job only.
@ayushdhamani12383 жыл бұрын
Thanks.. I understood that..but how tapping is preventing latchup..what was explained is that tapcell helps to reduce area , but in regular stdcell in which nwell and psubstrate are tapped with vdd and gnd..does latchup occur in those cells ?
@prasannashanbhogue40703 жыл бұрын
Sir, but you haven't explained how tap cells prevent Latch-up problem. :(
@TeamVLSI3 жыл бұрын
Hi Prasanna, Thanks for your concerns. I have just revisited the video and I found I have talked about it at 19:25 . But If you still need more clarity. I can make it more simple. I will try to publish a video focused on that.